Van Til Mechanical Fabricating, Inc

Login Article Information A nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation Choonsup Lee; Yang, E.H.; Myung, N.V.; George, T. Nanotechnology, 2003. IEEE-NANO 2003. 2003 Third IEEE Conference on Volume 2, Issue , 12-14 Aug. 2003 Page(s): 553 - 556 vol. 2 Digital Object Identifier 10.1109/NANO.2003.1230970 Summary: We have developed a new nanochannel fabrication technique using chemical-mechanical polishing (CMP) and thermal oxidation. With this technique, it is possible to control the width, length, and depth of the nanochannels without the need for nanolithography. The use of sacrificial SiO/sub 2/ layers allows the fabrication of centimeter-long nanochannels. In addition, the fabrication process is CMOS compatible. We have successfully fabricated an array of extremely long and narrow nanochannels (i.e. 10 mm long, 25 nm wide and 100 nm deep) with smooth inner surfaces. IEEE Members Log in by entering your IEEE Web Account Username and Password. IEEE Communications Society members: If you subscribe to the IEEE Electronic Periodicals Package or IEEE Electronic Periodica...